Electrochemical machining with ultrashort voltage pulses: Modelling of charging dynamics and feature profile evolution

Nanotechnology

Volumn 16, Issue 7, 2005, Pages

  Kenney, Jason A ^a   Hwang, Gyeong S ^a  

^a The University of Texas at Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; COMPUTER SIMULATION; DEPOSITION; ELECTRIC POTENTIAL; ELECTROCHEMICAL ELECTRODES; ELECTROCHEMISTRY; ETCHING; NANOSTRUCTURED MATERIALS;

CHARGING DYNAMICS; ELECTROCHEMICAL MACHINING; NANOMATERIALS; NANOSYSTEMS; ULTRASHORT VOLTAGE PULSES;

MACHINING;

EID: 21144453697     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/16/7/001     Document Type: Article

References (10)

1. Schuster R, Kirchner V, Allongue P and Ertl G 2000 Science 289 98
2. Schuster R, Kirchner V, Xia X H, Bittner A M and Ertl G 1998 Phys. Rev. Lett. 80 5599
3. Trimmer A L, Hudson J L, Kock M and Schuster R 2003 Appl. Phys. Lett. 82 3327
4. Allongue P, Jiang P, Kirchner V, Trimmer A L and Schuster R 2004 J. Phys. Chem. B 108 14434
5. Sethian J A 1999 Level Set Methods and Fast Marching Methods (Cambridge: Cambridge University Press)
6. Adalsteinsson D and Sethian J A 1999 J. Comput. Phys. 148 2
7. Bard A J and Faulkner L R 2001 Electrochemical Methods: Fundamentals and Applications (New York: Wiley)
8. Kenney J A and Hwang G S 2005 J. Chem. Phys. submitted
9. Kenney J A, Hwang G S and Shin W 2004 Appl. Phys. Lett. 84 3774
10. Kenney J A and Hwang G S 2004 Proc. Electrochem. Soc. at press