Site of Er ions in silica layers codoped with Si nanoclusters and Er

Applied Physics Letters

Volumn 88, Issue 12, 2006, Pages

  Pellegrino, P ^a   Garrido, B ^a   Arbiol, J ^a   Garcia, C ^a   Lebour, Y ^a   Morante, J R ^a  

^a UNIVERSITY OF BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; AMORPHOUS SILICON; ANNEALING; DOPING (ADDITIVES); ERBIUM; IMAGE PROCESSING; IONS; LAYERED MANUFACTURING; RAMAN SCATTERING; SILICA; SILICON; TRANSMISSION ELECTRON MICROSCOPY; TUNING;

AMORPHOUS SI PRECIPITATES; DELETERIOUS EFFECTS; ENERGY-FILTERED TRANSMISSION ELECTRON MICROSCOPY (EFTEM); HIGH ANNULAR ANGLE DARK FIELD (HAADF);

NANOSTRUCTURED MATERIALS;

EID: 33645510094     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2190267     Document Type: Article

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