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Volumn , Issue 4, 2006, Pages 432-433

Group 6 metal complexes with a hemilabile tridentate xantsil ligand and facile insertion of tBuCN into a W-Si bond [xantsil = (9,9-dimethylxanthene-4,5-diyl)bis(dimethylsilyl)]

(3) Begum, Rockshana a Komuro, Takashi a Tobita, Hiromi a

a TOHOKU UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

METAL COMPLEX; SILANE DERIVATIVE; SILICON; TUNGSTEN; XANTHENE DERIVATIVE;

ARTICLE; CHEMICAL STRUCTURE; COMPLEX FORMATION; DISSOCIATION; PROTON NUCLEAR MAGNETIC RESONANCE; REACTION ANALYSIS; STRUCTURE ANALYSIS; SYNTHESIS; ULTRAVIOLET IRRADIATION; X RAY DIFFRACTION;

EID: 33645459912 PISSN: 13597345 EISSN: None Source Type: Journal
DOI: 10.1039/b512759a Document Type: Article

Times cited : (23)

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