Electrical characterization of a dc secondary discharge created during plasma sputtering deposition of palladium thin films

Plasma Sources Science and Technology

Volumn 9, Issue 2, 2000, Pages 176-182

  Thomann, A L ^a   Charles, C ^b   Cherradi, N ^a   Brault, P ^a  

^a UNIVERSITÉ D'ORLÉANS   (France)

^b AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ELECTRIC BREAKDOWN OF GASES; ELECTRIC CURRENTS; IONS; METALLIC FILMS; PALLADIUM; PLASMA APPLICATIONS; PLASMA DENSITY; PLASMA SHEATHS; SILICA; SPUTTER DEPOSITION; THIN FILMS;

PLASMA SPUTTERING DEPOSITION;

PLASMA SOURCES;

EID: 0033733981     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/9/2/310     Document Type: Article

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