Influences of oxide material on high density plasma production using capacitively coupled discharge

Thin Solid Films

Volumn 506-507, Issue , 2006, Pages 545-549

  Ohtsu, Y ^a   Shimazoe, T ^a   Misawa, T ^a   Fujita, H ^a  

^a SAGA UNIVERSITY   (Japan)

Author keywords

Breakdown voltage; Capacitively coupled discharge plasma; High density plasma; Oxide material electrode; Secondary electron emission

Indexed keywords

CARRIER CONCENTRATION; COPPER OXIDES; ELECTRIC BREAKDOWN; ELECTRODES; MAGNESIA; OXIDES; SECONDARY EMISSION; TITANIUM OXIDES;

CAPACITIVELY COUPLED DISCHARGE; CAPACITIVELY COUPLED DISCHARGE PLASMA; HIGH DENSITY PLASMA; OXIDE MATERIAL ELECTRODE; SECONDARY ELECTRON EMISSION;

PLASMA DENSITY;

EID: 33645229359     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.071     Document Type: Article

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