메뉴 건너뛰기




Volumn 15, Issue 2, 2006, Pages 600-606

Microneedle fabrication using the plane pattern to cross-section transfer method

Author keywords

[No Author keywords available]

Indexed keywords

SYNCHROTRON RADIATION; TENSILE STRENGTH; X RAY LITHOGRAPHY;

EID: 33645032207     PISSN: 09641726     EISSN: 1361665X     Source Type: Journal    
DOI: 10.1088/0964-1726/15/2/043     Document Type: Article
Times cited : (11)

References (15)
  • 1
    • 0028950885 scopus 로고
    • Deep x-ray lithography for the production of three-dimensional microstructures from metals, polymers, and ceramics
    • 10.1016/0969-806X(93)E0007-R 0969-806X
    • Ehrfeld W and Lher H 1995 Deep x-ray lithography for the production of three-dimensional microstructures from metals, polymers, and ceramics Radiat. Phys. Chem. 45 340
    • (1995) Radiat. Phys. Chem. , vol.45 , Issue.3 , pp. 349
    • Ehrfeld, W.1    Lher, H.2
  • 2
    • 0031382524 scopus 로고    scopus 로고
    • Calculation and experimental determination of the structure transfer accuracy in deep x-ray lithography
    • 0960-1317 008
    • Feierag G, Ehrfeld W, Lehr H, Schmidt A and Schmidt M 1997 Calculation and experimental determination of the structure transfer accuracy in deep x-ray lithography. J. Micromech. Microeng. 7 323
    • (1997) J. Micromech. Microeng. , vol.7 , Issue.4 , pp. 323
    • Feierag, G.1    Ehrfeld, W.2    Lehr, H.3    Schmidt, A.4    Schmidt, M.5
  • 3
    • 3042779978 scopus 로고    scopus 로고
    • A novel fabrication process of 3D microstructures by double exposure in standard deep x-ray lithography
    • Matsuzuka N, Hirai Y and Tabata O 2004 A novel fabrication process of 3D microstructures by double exposure in standard deep x-ray lithography Proc. MSMS'04 (Maastricht, Netherlands) p681
    • (2004) Proc. MSMS'04 , pp. 681
    • Matsuzuka, N.1    Hirai, Y.2    Tabata, O.3
  • 4
    • 3142666016 scopus 로고    scopus 로고
    • Fundamental limitations of LIGA x-ray lithography: Sidewall offset, slope and minimum feature size
    • 0960-1317
    • Griffiths S K 2005 Fundamental limitations of LIGA x-ray lithography: sidewall offset, slope and minimum feature size J. Micromech. Microeng. 14 999
    • (2005) J. Micromech. Microeng. , vol.14 , pp. 999
    • Griffiths, S.K.1
  • 5
    • 27744466427 scopus 로고    scopus 로고
    • Fabrication of microneedle array using inclined LIGA process
    • Moon S J and Seung S L 2003 Fabrication of microneedle array using inclined LIGA process Proc. Transducers'03 (Boston, USA) p1546
    • (2003) Proc. Transducers'03 , pp. 1546
    • Moon, S.J.1    Seung, S.L.2
  • 6
    • 6344288142 scopus 로고    scopus 로고
    • Investigation of x-ray mask patterns for fabrication of microneedle array using SR lithography
    • Kawaguchi G, Samoto N, Tosa H and Sugiyama S 2003 Investigation of x-ray mask patterns for fabrication of microneedle array using SR lithography Proc. 20th Sensor Symp. (Tokyo, Japan) p397
    • (2003) Proc. 20th Sensor Symp. , pp. 397
    • Kawaguchi, G.1    Samoto, N.2    Tosa, H.3    Sugiyama, S.4
  • 8
    • 0348147677 scopus 로고    scopus 로고
    • Surgical treatment of facial acne scars based on morphologic classification: A Brazilian experience
    • 10.1111/j.1524-4725.2003.29388.x 1076-0512
    • Kadunc B V and Trindade de Almeida A R 2003 Surgical treatment of facial acne scars based on morphologic classification: a Brazilian experience Dermatol. Surg. 12 1200
    • (2003) Dermatol. Surg. , vol.29 , Issue.12 , pp. 1200
    • Kadunc, B.V.1    Trindade De Almeida, A.R.2
  • 13
    • 7044241062 scopus 로고    scopus 로고
    • Plain-pattern to cross-section transfer (PCT) technique for deep x-ray lithography and applications
    • 0960-1317 015
    • Sugiyama S, Khumpuang S and Kawaguchi G 2004 Plain-pattern to cross-section transfer (PCT) technique for deep x-ray lithography and applications J. Micromech. Microeng. 14 1399
    • (2004) J. Micromech. Microeng. , vol.14 , Issue.10 , pp. 1399
    • Sugiyama, S.1    Khumpuang, S.2    Kawaguchi, G.3
  • 14
    • 20344391415 scopus 로고    scopus 로고
    • Method for accurately shape-prediction of 3D structure fabricated by x-ray lithography
    • doi:10.1117/12.582325
    • Horade M, Khumpuang S, Fujioka K and Sugiyama S 2004 Method for accurately shape-prediction of 3D structure fabricated by x-ray lithography Proc. SPIE-Smart Materials, Nano, Micro-Smart Syst. (Sydney, Australia) p418
    • (2004) Proc. SPIE , vol.5650 , pp. 418
    • Horade, M.1    Khumpuang, S.2    Fujioka, K.3    Sugiyama, S.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.