A novel fabrication process of 3-D microstructures by double exposure in standard deep X-ray lithography

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2004, Pages 681-684

  Matsuzuka, Naoki ^a   Hirai, Yoshikazu ^a   Tabata, Osamu ^b  

^a RITSUMEIKAN UNIVERSITY   (Japan)

^b KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

IRRADIATION; LITHOGRAPHY; MASKS; MICROELECTROMECHANICAL DEVICES; OPTIMIZATION; PROCESS CONTROL;

DEEP X-RAY LITHOGRAPHY (DXL); MICRO-NEEDLE ARRAYS; X-RAY EXPOSURES; X-RAY MASKS;

MICROSTRUCTURE;

EID: 3042779978     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)

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