Effect of annealing on the conductivity of electroless deposited Ni nanowires and films

IEEE Transactions on Nanotechnology

Volumn 5, Issue 2, 2006, Pages 138-141

  Mani, Sathya ^a   Saif, Taher ^a   Han, Jong H ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

Annealing; Four point; In situ; Nanowires; Nickel; Resistivity

Indexed keywords

ANNEALING; ELECTRIC CONDUCTIVITY; GRAIN BOUNDARIES; NANOSTRUCTURED MATERIALS; OXIDATION; THERMAL EFFECTS; THIN FILMS;

ELECTRON-PHONON INTERACTION; GRAIN-BOUNDARY ATTRITION; NANOFILMS; NONOXIDIZING ENVIRONMENT;

ELECTROLESS PLATING;

EID: 33645002019     PISSN: 1536125X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNANO.2006.869662     Document Type: Article

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