Properties of transparent oxide thin films prepared by plasma deposition

Optica Applicata

Volumn 35, Issue 4, 2005, Pages 425-430

  Domaradzki, Jaroslaw ^a   Borkowska, Agnieszka ^a   Kaczmarek, Danuta ^a   Prociów, Eugeniusz L ^a  

^a WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

Hot target; Sputtering process; Titanium oxide; Transparent thin film

Indexed keywords

CRYSTALLIZATION; DEPOSITION; OPTICAL PROPERTIES; PLASMAS; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; MICROSTRUCTURE; SILICON COMPOUNDS; SUBSTRATES; X RAY DIFFRACTION;

HOT TARGET; SPUTTERING PROCESS; TRANSPARENT THIN FILM; TITANIUM OXIDE;

THIN FILMS;

EID: 33644967983     PISSN: 00785466     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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