Nanostructured Ti-B-C-N thin films produced from composite targets using unbalanced magnetron sputtering

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 2005, Pages 547-555

  Zhong, D ^a   Park, I W ^a   Kunrath, A O ^a   Mishra, B ^a   Kim, K H ^b   Voevodin, A A ^c   Levashov, E A ^d   Moore, J J ^a  

^a Department of Geology and Geological Engineering   (United States)

^b Pusan National University   (South Korea)

^c AIR FORCE RESEARCH LABORATORY   (United States)

^d NATIONAL UNIVERSITY OF SCIENCE AND TECHNOLOGY MISIS   (Russian Federation)

Author keywords

Nanocomposite coatings; Physical vapor deposition; Ti B C N; Unbalanced magnetron sputtering

Indexed keywords

PHYSICAL VAPOR DEPOSITION; TI-B-C-N; UNBALANCED MAGNETRON SPUTTERING;

MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; OXIDATION; PHYSICAL VAPOR DEPOSITION; TITANIUM COMPOUNDS;

THIN FILMS;

EID: 33644967474     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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