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Volumn 504, Issue 1-2, 2006, Pages 95-100

A study of Si/SiGe selective epitaxial growth by experimental design approach

Author keywords

Chemical vapor deposition processes; Doping; Germanium silicon alloys

Indexed keywords

CHEMICAL VAPOR DEPOSITION; GERMANIUM COMPOUNDS; OPTICAL DESIGN; SEMICONDUCTOR DOPING; SILICON COMPOUNDS; TEMPERATURE CONTROL; X RAY DIFFRACTION;

EID: 33644931597     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.09.049     Document Type: Conference Paper
Times cited : (9)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.