Effects of Si(001) surface amorphization on ErSi2 thin film

Thin Solid Films

Volumn 504, Issue 1-2, 2006, Pages 157-160

  Tan, E J ^a,d   Kon, M L ^b   Pey, K L ^a   Lee, P S ^c   Zhang, Y W ^b   Wang, W D ^d   Chi, D Z ^d  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^d INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

Author keywords

Amorphization; Erbium silicide; Morphology; Thin film

Indexed keywords

AMORPHIZATION; ERBIUM COMPOUNDS; PLASMA APPLICATIONS; RAPID THERMAL ANNEALING; SCHOTTKY BARRIER DIODES; SILICON COMPOUNDS;

ERBIUM SILICIDE; PRE-AMORPHIZATION; SUBSTRATE AMORPHIZATION;

THIN FILMS;

EID: 33644919098     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.09.067     Document Type: Conference Paper

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