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Volumn 102, Issue , 1996, Pages 142-146

Oxidation of thin erbium and erbium silicide overlayers in contact with silicon oxide films thermally grown on silicon

Author keywords

Crystalline amorphous interfaces; Erbium silicide; Oxidation; Rutherford backscattering spectroscopy; X ray photoelectron spectroscopy

Indexed keywords

ANNEALING; ERBIUM COMPOUNDS; EVAPORATION; FILM GROWTH; INTERFACES (MATERIALS); OXIDATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0030564920     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(96)00034-7     Document Type: Article
Times cited : (27)

References (13)
  • 1
    • 0009340993 scopus 로고
    • N.G. Einspruch Academic Press, New York
    • M.A. Nicolet, in: VLSI Electronics, ed. N.G. Einspruch (Academic Press, New York, 1983).
    • (1983) VLSI Electronics
    • Nicolet, M.A.1
  • 13
    • 0003828439 scopus 로고
    • D. Briggs and M.P. Seah, Wiley, New York
    • M.P. Seah, in: Practical Surface Analysis, ed. D. Briggs and M.P. Seah, Vol. 1 (Wiley, New York, 1990).
    • (1990) Practical Surface Analysis , vol.1
    • Seah, M.P.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.