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Volumn 102, Issue , 1996, Pages 142-146
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Oxidation of thin erbium and erbium silicide overlayers in contact with silicon oxide films thermally grown on silicon
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Author keywords
Crystalline amorphous interfaces; Erbium silicide; Oxidation; Rutherford backscattering spectroscopy; X ray photoelectron spectroscopy
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Indexed keywords
ANNEALING;
ERBIUM COMPOUNDS;
EVAPORATION;
FILM GROWTH;
INTERFACES (MATERIALS);
OXIDATION;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SEMICONDUCTING SILICON COMPOUNDS;
THIN FILMS;
X RAY PHOTOELECTRON SPECTROSCOPY;
CRYSTALLINE AMORPHOUS INTERFACES;
ERBIUM SILICIDE;
SOLID PHASE REACTIONS;
ULTRAHIGH VACUUM (UHV) DEPOSITION;
SEMICONDUCTING FILMS;
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EID: 0030564920
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/0169-4332(96)00034-7 Document Type: Article |
Times cited : (27)
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References (13)
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