Development of plasma etching process for sub-50 nm TaN gate

Thin Solid Films

Volumn 504, Issue 1-2, 2006, Pages 140-144

  Bliznetsov, Vladimir ^a   Kumar, Rakesh ^a   Bera, Lakshmi Kanta ^a   Yip, Loh Wei ^a   Du, Anyan ^a   Hui, Tang Ern ^b  

^a INSTITUTE OF MICROELECTRONICS   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

DPS; HfAlO; Plasma etching; TaN etching

Indexed keywords

CMOS INTEGRATED CIRCUITS; INORGANIC POLYMERS; PLASMA SOURCES; SILICON COMPOUNDS; TITANIUM NITRIDE; TRANSISTORS;

DEPLETION EFFECT; DPS; HFALO; TAN ETCHING;

PLASMA ETCHING;

EID: 33644895390     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.09.158     Document Type: Conference Paper

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