Imaging thin films of nanoporous low-k dielectrics: Comparison between ultramicrotomy and focused ion beam preparations for transmission electron microscopy

Microscopy and Microanalysis

Volumn 12, Issue 2, 2006, Pages 156-159

  Thompson, Leslie E ^a   Rice, Philip M ^a   Delenia, Eugene ^a   Lee, Victor Y ^a   Brock, Phillip J ^a   Magbitang, Teddie P ^a   Dubois, Geraud ^a   Volksen, Willi ^a   Miller, Robert D ^a   Kim, Ho Cheol ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

FIB; Low k materials; Nanoporous materials; TEM; Ultramicrotomy

Indexed keywords

ION; NANOPARTICLE;

ARTICLE; ELECTRON MICROSCOPY; IMAGE PROCESSING; METHODOLOGY; MICROSCOPY; ULTRAMICROTOMY;

CRYOULTRAMICROTOMY; IMAGE PROCESSING, COMPUTER-ASSISTED; IONS; MICROSCOPY; MICROSCOPY, ELECTRON; NANOPARTICLES;

EID: 33644849141     PISSN: 14319276     EISSN: 14358115     Source Type: Journal    
DOI: 10.1017/S1431927606060041     Document Type: Article

References (7)

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