Using FIB for TEM analysis of semiconductor materials

Solid State Technology

Volumn 45, Issue SUPP., 2002, Pages

  Moore, Mary V ^a   Rozeveld, Steve ^a   Beach, Elvin ^a  

^a Thermo Fisher Scientific   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; DIELECTRIC MATERIALS; ELECTRON ENERGY LOSS SPECTROSCOPY; ETCHING; ION BEAMS; NANOSTRUCTURED MATERIALS; PROCESS ENGINEERING; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; X RAY ANALYSIS;

FOCUSED ION BEAMS (FIB);

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0036748372     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (2)

1. R.J. Young et al., "High Yield and High Throughput TEM Sample Preparation Using Focused Ion Beam Automation," ISTFA 1998 Proceedings.
2. M.V. Moore, "Recent Advances in Dual Beam TEM Sample Preparation," Microscopy and Microanalysis 2002 Proceedings.