Amorphous SiOx nanowires grown on silicon (100) substrates via rapid thermal process of nanodiamond films

Thin Solid Films

Volumn 503, Issue 1-2, 2006, Pages 18-21

  Liang, Xingbo ^a   Wang, Lei ^a   Yang, Deren ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

Diamond; Growth mechanism; Nanostructures; Silicon oxide

Indexed keywords

AMORPHOUS MATERIALS; DIAMOND FILMS; DIAMONDS; ELECTRON DIFFRACTION; GRAIN BOUNDARIES; MORPHOLOGY; NANOTECHNOLOGY; RAPID THERMAL ANNEALING; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

GROWTH MECHANISM; NANOSTRUCTURES; NANOWIRES; RAPID THERMAL PROCESS (RTP);

WIRE;

EID: 33644770168     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.09.168     Document Type: Article

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