Optical thin films with high reflectance, low thickness and low stress for the spectral range from vacuum UV to near IR

Journal of Optics A: Pure and Applied Optics

Volumn 8, Issue 3, 2006, Pages 327-332

  Yang, Minghong ^a   Gatto, Alexandre ^a   Kaiser, Norbert ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

Metals and metallic alloys; Multilayers; Nonelectronic; Physical properties of thin films; Vacuum deposition

Indexed keywords

ALUMINUM; DIELECTRIC MATERIALS; FLUORINE COMPOUNDS; INFRARED RADIATION; OPTICAL FILMS; ULTRAVIOLET RADIATION;

METALS AND METALLIC ALLOYS; NONELECTRONIC; VACUUM DEPOSITION;

THIN FILMS;

EID: 33644754770     PISSN: 14644258     EISSN: 17413567     Source Type: Journal    
DOI: 10.1088/1464-4258/8/3/016     Document Type: Article

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