Image-based metrology software for analysis of features on masks and wafers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5567, Issue PART 2, 2004, Pages 1005-1010

  Munir, Saghir ^a   Bald, Dan ^a   Tolani, Vikram ^a   Haussecker, Horst ^a  

^a INTEL CORPORATION   (United States)

Author keywords

Image Processing; Metrology; Pattern Fidelity; SEM; Tebaldi

Indexed keywords

AERIAL IMAGING SYSTEMS; PATTERN FIDELITY; SITE OF INTEREST (SI); TEBALDI;

COMPUTER AIDED DESIGN; COMPUTER SIMULATION; COMPUTER SOFTWARE; DATABASE SYSTEMS; IMAGING TECHNIQUES; NONLINEAR SYSTEMS; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

MASKS;

EID: 19844380569     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.569135     Document Type: Conference Paper

References (3)

1. Munir, S., Bald, D., Tolani, V., Ghadiali, F. and Lieberman, B., "DIVAS: Fully Automated Simulation Based Mask Defect Dispositioning and Defect Management System", Bacus Conference, Monterey, CA, September, 2004.
2. Munir, S., Bald, D., Tolani, V. and Ghadiali, F., "DIVAS: An Integrated Networked System for Mask Defect Dispositioning and Defect Management", SPIE, Santa Clara, CA, February, 2003.
3. Bald, D., Munir, S., Lieberman, B., Howard, W. and Mack, C., "PRIMADONNA: A System for Automated Defect Dispositioning of Production Masks Using Wafer Lithography Simulation", Bacus Conference, Monterey, CA, September, 2002.