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Volumn 13, Issue 3, 2004, Pages
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Modeling of immersion lithography for OPC
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Author keywords
[No Author keywords available]
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Indexed keywords
IMMERSION LITHOGRAPHY;
LIQUID IMMERSION OPTICS;
OPTICAL PROXIMITY CORRECTION;
COMPUTER SIMULATION;
LIGHT POLARIZATION;
MASKS;
MATHEMATICAL MODELS;
VECTORS;
PHOTOLITHOGRAPHY;
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EID: 19244366149
PISSN: 1074407X
EISSN: None
Source Type: Trade Journal
DOI: None Document Type: Article |
Times cited : (3)
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References (7)
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