Fabrication of nonspherical colloidal particles via reactive ion etching of surface-patterned colloidal crystals

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 277, Issue 1-3, 2006, Pages 27-36

  Zheng, Yuebing ^a   Wang, Yanhua ^b   Wang, Shijie ^a   Huan, Cheng Hon A ^a,c  

^a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Colloidal crystals; Nonspherical colloidal particles; Patterning; Reactive ion etching; Self assembly

Indexed keywords

CRYSTALS; PARTICLES (PARTICULATE MATTER); REACTIVE ION ETCHING; SELF ASSEMBLY;

COLLOIDAL CRYSTALS; NONSPHERICAL COLLOIDAL PARTICLES; PATTERNING;

COLLOIDS;

METAL; SILICON DIOXIDE;

ARTICLE; CERAMICS; CHEMICAL PROCEDURES; COLLOID; CRYSTAL; NANOPARTICLE; PARTICLE SIZE; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR;

EID: 33644553834     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.colsurfa.2005.11.005     Document Type: Article

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