Improved interatomic potential for stressed Si, O mixed systems

Applied Surface Science

Volumn 234, Issue 1-4, 2004, Pages 207-213

  Watanabe, T ^a,b   Yamasaki, D ^a   Tatsumura, K ^a   Ohdomari, I ^a  

^a WASEDA UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

SiO 2 film; Steric hindrance; Three body term

Indexed keywords

COMPACTION; CORRELATION METHODS; HETEROJUNCTIONS; MATHEMATICAL MODELS; STRAIN; STRESSES; THIN FILMS; X RAY DIFFRACTION;

BOND STRETCHING; OXIDE FILMS; STERIC HINDRANCES;

SILICA;

EID: 3342983212     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.05.035     Document Type: Conference Paper

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