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Volumn 1998-October, Issue , 1998, Pages 178-181
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Strain engineered InxGa1-xAs channel pHEMTs on virtual substrates: A simulation study
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Author keywords
[No Author keywords available]
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Indexed keywords
ALUMINUM COMPOUNDS;
GALLIUM ARSENIDE;
III-V SEMICONDUCTORS;
INDIUM PHOSPHIDE;
IONIC CONDUCTION;
SEMICONDUCTING INDIUM GALLIUM ARSENIDE;
SEMICONDUCTING INDIUM PHOSPHIDE;
SEMICONDUCTOR ALLOYS;
BREAKDOWN CHARACTERISTICS;
CONTROL BUFFERS;
PSEUDO-MORPHIC HIGH ELECTRON MOBILITY TRANSISTORS;
RF CHARACTERISTICS;
SIMULATION STUDIES;
STRAIN ENGINEERING;
STRAINED CHANNELS;
VIRTUAL SUBSTRATES;
HIGH ELECTRON MOBILITY TRANSISTORS;
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EID: 33244458076
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/IWCE.1998.742741 Document Type: Conference Paper |
Times cited : (1)
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References (11)
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