Comparison of optical resistance of ion assisted deposition and standard electron beam deposition methods for high reflectance dielectric coatings

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5963, Issue , 2005, Pages

  Melninkaitis, A ^a   Maciulevicius, M ^a   Rakickas, T ^a   Miksys, D ^a   Grigonis, R ^a   Sirutkaitis, V ^a   Skrebutenas, A ^b   Buzelis, R ^c   Drazdys, R ^c   Abromavicius, G ^c  

^a VILNIUS UNIVERSITY   (Lithuania)

^b Optida Co   (Lithuania)

^c CENTER FOR PHYSICAL SCIENCES AND TECHNOLOGY   (Lithuania)

Author keywords

Ion assisted deposition; LIDT; Optical coatings; Optical damage; S on 1

Indexed keywords

ELECTRON BEAMS; LASER APPLICATIONS; MICROSCOPIC EXAMINATION; MORPHOLOGY; OPTICAL COATINGS; THIN FILMS;

ION ASSISTED DEPOSITION; LASER-INDUCED DAMAGE THRESHOLD (LIDT); OPTICAL DAMAGE; S-ON-1;

DEPOSITION;

EID: 33144470420     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.619987     Document Type: Conference Paper

References (13)

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