Effect of deposition method and substrate surface quality on laser-induced damage threshold for repetitive 13-ns and 130-fs pulses

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5647, Issue , 2005, Pages 43-52

  Melninkaitis, A ^a   Rakickas, T ^a   Miksys, D ^a   Grigonis, R ^a   Sirutkaitis, V ^a   Skrebutenas, A ^b   Buzelis, R ^c   Drazdys, R ^c   Abromavicius, G ^c   Juskenas, R ^c   Selskis, A ^c  

^a VILNIUS UNIVERSITY   (Lithuania)

^b Optida Co   (Lithuania)

^c CENTER FOR PHYSICAL SCIENCES AND TECHNOLOGY   (Lithuania)

Author keywords

Femtosecond pulses; Ion assisted deposition; Nanosecond pulses; Optical coatings; Optical damage; S on 1 test

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; DIELECTRIC MATERIALS; ELECTRON BEAMS; EVAPORATION; MIRRORS; OPTICAL COATINGS; X RAY DIFFRACTION ANALYSIS;

FEMTOSECOND PULSES; ION ASSISTED DEPOSITION; OPTICAL DAMAGE; S-ON-1 TEST;

LASER DAMAGE;

EID: 20844437415     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.585300     Document Type: Conference Paper

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