Fabrication of the tip of GaAs microwave probe by wet etching

Proceedings of the ASME/Pacific Rim Technical Conference and Exhibition on Integration and Packaging of MEMS, NEMS, and Electronic Systems: Advances in Electronic Packaging 2005

Volumn PART C, Issue , 2006, Pages 1919-1922

  Ju, Yang ^a   Sato, Hiroyuki ^a   Soyama, Hitoshi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; ETCHING; SEMICONDUCTING GALLIUM ARSENIDE; SURFACE TOPOGRAPHY;

ETCHING MASK; MICRO TIP;

MICROWAVES;

EID: 32844466337     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)

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6. Iwata, N. Wakayama, T. and Yamada, S., 2004, "Establishment of basic process to fabricate full GaAs cantilever for scanning probe microscope applications," Sensors and Actuators A, Vol. 111, No. 1, pp. 26-31.
7. 2O," Journal of Electrochemical Society, Vol. 130, No. 9, pp. 1934-1941.