SCOPUS 정보 검색 플랫폼

Volumn 501, Issue 1-2, 2006, Pages 92-94

Thermal stability of hot-wire deposited amorphous silicon

Author keywords

Chemical vapour deposition; Crystallization; Diffusion; Silicon

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; RAMAN SCATTERING; SILANES; THERMAL DIFFUSION; THERMODYNAMIC STABILITY;

ELEVATED TEMPERATURES; HOT-WIRE; HYDROGENATED AMORPHOUS SILICON; MATERIAL PROPERTIES;

AMORPHOUS SILICON;

EID: 32644481211 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2005.07.131 Document Type: Conference Paper

Times cited : (12)

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