Improved mobility of amorphous silicon thin-film transistors deposited by hot-wire chemical vapor deposition on glass substrates

Applied Physics Letters

Volumn 70, Issue 20, 1997, Pages 2714-2716

  Chu, V ^a   Jarego, J ^a   Silva, H ^a   Silva, T ^a   Reissner, M ^a,c   Brogueira, P ^b   Conde, J P ^b  

^a INESC   (Portugal)

^b INSTITUTO SUPERIOR TÉCNICO   (Portugal)

^c SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0037711007     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.119001     Document Type: Article

References (20)

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