Formation of MoSi2-SiO2 coatings on molybdenum substrates by CVD/MOCVD

Surface and Coatings Technology

Volumn 200, Issue 12-13, 2006, Pages 3980-3986

  Nyutu, Edward K ^a   Kmetz, Michael A ^b   Suib, Steven L ^a  

^a UNIVERSITY OF CONNECTICUT   (United States)

^b PRATT AND WHITNEY   (United States)

Author keywords

Chemical vapor deposition; Molybdenum disilicide; Organometallic CVD; Silicon dioxide

Indexed keywords

DEPOSITION; ELECTRON SPECTROSCOPY; FIELD EMISSION MICROSCOPES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOLYBDENUM; OXIDATION RESISTANCE; SCANNING ELECTRON MICROSCOPY; SILICA; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

CYCLIC OXIDATION TEST; ISOTHERMAL TEST; MOLYBDENUM DISILICIDE; MOLYBDENUM SUBSTRATE; ORGANOMETALLIC CHEMICAL VAPOR DEPOSITION; SILICA COATINGS;

SILICONE COATINGS;

DEPOSITION; ELECTRON SPECTROSCOPY; FIELD EMISSION MICROSCOPES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOLYBDENUM; OXIDATION RESISTANCE; SCANNING ELECTRON MICROSCOPY; SILICA; SILICONE COATINGS; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

EID: 32644475730     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.02.212     Document Type: Article

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