Growth kinetics of MoSi2 coating formed by a pack siliconizing process

Journal of the Electrochemical Society

Volumn 151, Issue 6, 2004, Pages

  Yoon, Jin Kook ^a   Lee, Kyung Hwan ^b   Kim, Gyeung Ho ^a   Lee, Jong Kwon ^a   Doh, Jung Mann ^a   Hong, Kyung Tae ^a  

^a Korea Institute of Science and Technology   (South Korea)

^b Korea University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIFFUSION; GROWTH (MATERIALS); MATHEMATICAL MODELS; POWDERS; PROTECTIVE COATINGS; REACTION KINETICS; SILICA;

ISOTHERMAL CONDITION; SILICONIZING PROCESS; SOLID-STATE DIFFUSION;

MOLYBDENUM COMPOUNDS;

EID: 2942679500     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1710896     Document Type: Article

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