The thickness uniformity of films deposited by magnetron sputtering with rotation and revolution

Surface and Coatings Technology

Volumn 200, Issue 12-13, 2006, Pages 3687-3689

  Fu, Chunlin ^a   Yang, Chuanren ^a   Han, Leigang ^a   Chen, Hongwei ^a  

^a CHONGQING UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Film thickness; Magnetron sputtering; Simulation

Indexed keywords

CATHODES; COMPUTER SIMULATION; SUBSTRATES; THICKNESS MEASUREMENT; THIN FILMS;

FILM THICKNESS; RADIO FREQUENCY MAGNETRON SPUTTERING; RELATIVE DEVIATIONS;

MAGNETRON SPUTTERING;

CATHODES; COMPUTER SIMULATION; MAGNETRON SPUTTERING; SUBSTRATES; THICKNESS MEASUREMENT; THIN FILMS;

EID: 32644467757     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.12.023     Document Type: Article

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