Film thickness variation in a cylindrical magnetron deposition device

Thin Solid Films

Volumn 293, Issue 1-2, 1997, Pages 78-82

  Car, Tihomir ^a   Radić, Nikola ^a  

^a RUDER BO KOVI INSTITUTE   (Croatia)

Author keywords

Aluminium; Copper; Plasma processing and deposition; Sputtering

Indexed keywords

ALUMINUM; BACKSCATTERING; COPPER; FILM PREPARATION; MAGNETRON SPUTTERING; MAGNETRONS; PLASMA APPLICATIONS; SPUTTER DEPOSITION; THIN FILMS;

PLASMA DEPOSITION;

METALLIC FILMS;

EID: 0030706682     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)08993-6     Document Type: Article

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