Effects of gas ring position and mesh introduction on film quality and thickness uniformity

Materials Science and Engineering B

Volumn 45, Issue 1-3, 1997, Pages 98-101

  Hong, Seungbum ^a   Kim, Eunah ^a   Jiang, Zhong Tao ^a   Bae, Byeong Soo ^a   No, Kwangsoo ^a   Lim, Sung Chul ^b   Woo, Sang Gyun ^b   Koh, Young Bum ^b  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b SAMSUNG Electronics   (South Korea)

Author keywords

Chromium oxide film; Morphology; Reactive magnetron sputter; Uniformity

Indexed keywords

CHROMIUM COMPOUNDS; MAGNETRON SPUTTERING; MORPHOLOGY; PLASMA STABILITY; SILICON WAFERS; SPUTTER DEPOSITION; SURFACE PHENOMENA;

CHROMIUM OXIDE;

METALLIC FILMS;

EID: 0010817303     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(96)01913-7     Document Type: Article

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