A new formula on the thickness of films deposited by planar and cylindrical magnetron sputtering

Thin Solid Films

Volumn 335, Issue 1-2, 1998, Pages 279-283

  Meng, X Q ^a   Fan, X J ^a   Guo, H X ^a  

^a WUHAN UNIVERSITY   (China)

Author keywords

Coatings; Deposition process; Sputtering; Surface morphology

Indexed keywords

FILMS; MATHEMATICAL MODELS; MORPHOLOGY; SPUTTER DEPOSITION;

CYLINDRICAL MAGNETRON SPUTTERING; PLANAR MAGNETRON SPUTTERING;

MAGNETRON SPUTTERING;

EID: 0032312091     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00890-6     Document Type: Article

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