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Volumn 103, Issue 2, 1999, Pages 322-329

Photolysis of Disilane at 193 nm

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0000052843     PISSN: 10895639     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp982348a     Document Type: Article
Times cited : (15)

References (34)
  • 21
    • 0000190430 scopus 로고    scopus 로고
    • Compton, G., Walsh, R., Eds.; Elsevier: Amsterdam
    • Becerra, R.; Walsh, R. Research in Chemical Kinetics III; Compton, G., Walsh, R., Eds.; Elsevier: Amsterdam, 1996; p 263.
    • (1996) Research in Chemical Kinetics , vol.3 , pp. 263
    • Becerra, R.1    Walsh, R.2
  • 28
    • 0347217369 scopus 로고
    • Tsukiyama, K.; Bersohn, R. J. Chem. Phys. 1987, 86, 747. Yi, W.; Chattopadhyay, A.; Bersohn, R. J. Chem. Phys. 1991, 94, 5994.
    • (1987) J. Chem. Phys. , vol.86 , pp. 747
    • Tsukiyama, K.1    Bersohn, R.2
  • 33
    • 0001529940 scopus 로고
    • McNesby, J. R.; Okabe, H. Adv. Photochem. 1964, 3, 157. Hampson, R. F., Jr.; McNesby, J. R. J. Chem. Phys. 1965, 42, 2200.
    • (1964) Adv. Photochem. , vol.3 , pp. 157
    • McNesby, J.R.1    Okabe, H.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.