SCOPUS 정보 검색 플랫폼 - 논문 보기

메뉴 건너뛰기

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 2 A, 2006, Pages 804-809

Effect of base vacuum level on plasma display panel discharge characteristics and efficacy

(2) Kwon, Sang Jik a Jang, Chan Kyu a

a Gachon University (South Korea)

Author keywords

Base vacuum level; Plasma display panel; Vacuum in line sealing

Indexed keywords

IMAGE PROCESSING; LIGHT SOURCES; OPTICAL PROPERTIES; PLASMA DEVICES; VACUUM;

BASE VACUUM LEVEL; PLASMA DISPLAY PANEL;

DISPLAY DEVICES;

EID: 32244432321 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/JJAP.45.804 Document Type: Article

Times cited : (2)

References (17)

1
- 0004263798
- H. Bechtel, P. J. Heijnen, A. H. M. Holtslag, M. Klein, R. Snijkers and H. Tolner: IDW'98, 1998, p. 527.
- (1998) IDW'98 , pp. 527
- Bechtel, H.¹ Heijnen, P.J.² Holtslag, A.H.M.³ Klein, M.⁴ Snijkers, R.⁵ Tolner, H.⁶

2
- 0001823954
- K. Amemiya, T. Komaki and T. Nishio: IDW'98, 1998, p. 531.
- (1998) IDW'98 , pp. 531
- Amemiya, K.¹ Komaki, T.² Nishio, T.³

3
- 0034337992
- S. J. Kwon, K. C. Hong, J. H. Sung, C. H. Lee, K. W. Whang, C. K. Yoon and J. D. Lee: J. Korean Phys. Soc. 37 (2000) 247.
- (2000) J. Korean Phys. Soc. , vol.37 , pp. 247
- Kwon, S.J.¹ Hong, K.C.² Sung, J.H.³ Lee, C.H.⁴ Whang, K.W.⁵ Yoon, C.K.⁶ Lee, J.D.⁷

4
- 0037273398
- S. J. Kwon, H. C. Yang and K. W. Whang: J. Vac. Sci. Technol. A 21 (2003) 206.
- (2003) J. Vac. Sci. Technol. A , vol.21 , pp. 206
- Kwon, S.J.¹ Yang, H.C.² Whang, K.W.³

5
- 1442284512
- G. Oversluizen, S. Zwart, M. F. Gillies, T. Dekker and T. J. Vink: Microelectron. J. 35 (2004) 319.
- (2004) Microelectron. J. , vol.35 , pp. 319
- Oversluizen, G.¹ Zwart, S.² Gillies, M.F.³ Dekker, T.⁴ Vink, T.J.⁵

6
- 0017017145
- H. Uchiike, K. Miura, N. Nakayama. T. Shinoda and Y. Fukushima: IEEE Trans. Electron Devices 23 (1976) 1211.
- (1976) IEEE Trans. Electron Devices , vol.23 , pp. 1211
- Uchiike, H.¹ Miura, K.² Nakayama, N.³ Shinoda, T.⁴ Fukushima, Y.⁵

7
- 0345307336
- ) B. Moine and G. Bizarri: Mater. Sci. Eng. B 105 (2003) 2.
- (2003) Mater. Sci. Eng. B , vol.105 , pp. 2
- Moine, B.¹ Bizarri, G.²

8
- 32244445171
- J. H. Shin and C. H. Park: J. Korean Inst. Electr. Electron. Mater. Eng. 15 (2002) 909.
- (2002) J. Korean Inst. Electr. Electron. Mater. Eng. , vol.15 , pp. 909
- Shin, J.H.¹ Park, C.H.²

9
- 0038685666
- J. H. Eun, J. H. Lee, S. G. Kim. M. Y. Um, S. Y. Park and H. J. Kim: Thin Solid Films 435 (2003) 199.
- (2003) Thin Solid Films , vol.435 , pp. 199
- Eun, J.H.¹ Lee, J.H.² Kim, S.G.³ Um, M.Y.⁴ Park, S.Y.⁵ Kim, H.J.⁶

10
- 0000261148
- E. H. Choi, H. J. Oh, Y. G. Kim, J. J. Ko, J. Y. Lim, J. G. Kim, D. I. Kim, G. S. Cho and S. O. Kang: Jpn. J. Appl. Phys. 37 (1998) 7015.
- (1998) Jpn. J. Appl. Phys. , vol.37 , pp. 7015
- Choi, E.H.¹ Oh, H.J.² Kim, Y.G.³ Ko, J.J.⁴ Lim, J.Y.⁵ Kim, J.G.⁶ Kim, D.I.⁷ Cho, G.S.⁸ Kang, S.O.⁹

11
- 85019097181
- A. Saito, T. Maeda, M. Tone, T. Shiga, S. Mikoshiba and G. Overshuizen: SID Int. Symp. Dig. Tech. Pap. 35 (2004) 210.
- (2004) SID Int. Symp. Dig. Tech. Pap. , vol.35 , pp. 210
- Saito, A.¹ Maeda, T.² Tone, M.³ Shiga, T.⁴ Mikoshiba, S.⁵ Overshuizen, G.⁶

12
- 0036408796
- Z. N. Yu, J. W. Seo, S. J. Yu, D. X. Zheng and J. Sun: Surf. Coat. Technol. 162 (2002) 11.
- (2002) Surf. Coat. Technol. , vol.162 , pp. 11
- Yu, Z.N.¹ Seo, J.W.² Yu, S.J.³ Zheng, D.X.⁴ Sun, J.⁵

13
- 32244445171
- J. H. Shin and C. H. Park: J. Korean Inst. Electr. Electron. Mater. Eng. 15 (2002) 909.
- (2002) J. Korean Inst. Electr. Electron. Mater. Eng. , vol.15 , pp. 909
- Shin, J.H.¹ Park, C.H.²

14
- 24644507427
- J. E. Heo, Y. K. Kim, M. N. Hur, Y. G. Kim and C. H. Park: IMID'01 Dig., 2001, p. 441.
- (2001) IMID'01 Dig. , pp. 441
- Heo, J.E.¹ Kim, Y.K.² Hur, M.N.³ Kim, Y.G.⁴ Park, C.H.⁵

15
- 0018031249
- W. E. Aheam: IBM J. Res. Dev. 22 (1978) 622.
- (1978) IBM J. Res. Dev. , vol.22 , pp. 622
- Aheam, W.E.¹

16
- 32244437737
- W. B. Park, J. Y. lim, J. S. Oh, H. S. Jeong, J. C. Jeong, S. B. Kim, I. R. Cho, J. W. Cho, S. O. Kang and E. H. Choi: IMID '03 Dig., 2003, p. 806.
- (2003) IMID '03 Dig. , pp. 806
- Park, W.B.¹ Lim, J.Y.² Oh, J.S.³ Jeong, H.S.⁴ Jeong, J.C.⁵ Kim, S.B.⁶ Cho, I.R.⁷ Cho, J.W.⁸ Kang, S.O.⁹ Choi, E.H.¹⁰

17
- 32244433074
- T. Hirakawa and H. Uchiike: SID Int. Symp. Dig. Tech. Pap. 35 (2004) 910.
- (2004) SID Int. Symp. Dig. Tech. Pap. , vol.35 , pp. 910
- Hirakawa, T.¹ Uchiike, H.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.