The route towards a high efficacy PDP; Influence of Xe partial pressure, protective layer, and phosphor saturation

Microelectronics Journal

Volumn 35, Issue 4, 2004, Pages 319-324

  Oversluizen, G ^a   De Zwart, S ^a   Gillies, M F ^a   Dekker, T ^a   Vink, T J ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

Efficacy; Partial pressure; Phosphor; Plasma display panel

Indexed keywords

DIELECTRIC MATERIALS; ELECTRIC DISCHARGES; IONIZATION; IONS; PARTIAL PRESSURE; PHOSPHORS; PHOTONS; QUANTUM EFFICIENCY; SECONDARY EMISSION; SPUTTERING; ULTRAVIOLET RADIATION; XENON;

ELECTRON HEATING EFFICIENCY; HIGH EFFICACY COLOR PANELS; PLASMA DISPLAY PANELS; SPUTTER RESISTANCE;

PLASMA DISPLAY DEVICES;

EID: 1442284512     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2692(03)00237-4     Document Type: Conference Paper

References (23)

1. Bechtel H., Heijnen P.J., Holtslag A.H.M., Klein M., Snijkers R., Tolner H. IDW'98. 1998;527.
2. Amemiya K., Komaki T., Nishio T. IDW'98. 1998;531.
3. Weber L.F. Euro Display'99. 1999;1.
4. Doyeux H., Deschamps J. SID'97. 1997;213.
5. Meunier J., Belenquer P., Boeuf J.-P. J. Appl. Phys. 78:1995;731.
6. Klein M., Snijkers R., Hagelaar G. IEICE Trans. Electron. E83-C:2000;1602.
7. Uchiike H., Miura K., Nakayama N., Shinoda T., Fukushima Y. IEEE Trans. Electron. Dev. 23:1976;1211.
8. Mikoshiba S., Shirai S., Shinada S., Fukushima M. J. Appl. Phys. 50:1979;1088.
9. Oversluizen G., de Zwart S., van Heusden S., Dekker T. J. SID. 8:2000;197.
10. Hagelaar J.M., Klein M., Snijkers R., Kroesen G. J. Appl. Phys. 89:2001;2033.
11. Okamoto Y. Jpn J. Appl. Phys. 22:1983;L7.
12. Ohi T., Shimozuma T., Yoshikawa K., Yasojima Y. Proc. Jpn. Display Conf. 1992;139.
13. Veerasingham R., Campbell R.B., McGrath R.T. Plasma Sources Sci. Technol. 6:1997;157.
14. Mikoshiba S., Murayama S. Appl. Phys. Lett. 37:1980;529.
15. Oversluizen G., Klein M., de Zwart S., van Heusden S., Dekker T. Appl. Phys. Lett. 77:2000;948.
16. Oversluizen G., Klein M., de Zwart S., van Heusden S., Dekker T. J. Appl. Phys. 91:2002;2403.
17. Yoshioka T., Tessier L., Okigawa A., Toki K. J. SID. 8:2000;203.
18. Suzuki K., Kanawami Y., Ho S., Uemura N., Yajima Y., Kouchi N., Hatano Y. J. Appl. Phys. 88:2000;5605.
19. Ikeda Y., Suzuki K., Fukumoto H., Verboncoeur J.P., Christenson P.J., Birdsall C.K., Shibata M., Ishigaki M. J. Appl. Phys. 88:2000;6216.
20. Gillies M.F., Oversluizen G. J. Appl. Phys. 91:2002;6315.
21. Oversluizen G., de Zwart S., van Heusden S., Dekker T. Proceedings of the Seventh International Display Workshops, Kobe, Japan. 2000;. p. 631.
22. Yoshioka T., Miyakoshi A., Okigawa A., Mizobata E., Toki K. Proceedings of the Seventh Intenational Display Workshops, Kobe, Japan. 2000;. p. 611.
23. Morell A., El Khiati N. J. Electrochem. Soc. 140:1993;2019.