New universal expression for the electron stopping power for energies between 200 eV and 30 keV

Surface and Interface Analysis

Volumn 38, Issue 2, 2006, Pages 76-83

  Jablonski, A ^a   Tanuma, S ^b   Powell, C J ^c  

^a INSTITUTE OF PHYSICAL CHEMISTRY   (Poland)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^c NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Electron inelastic mean free path; Monte Carlo simulations; Stopping power

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COMPUTER SIMULATION; MONTE CARLO METHODS; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRON INELASTIC MEAN FREE PATH; STOPPING POWER;

ELECTRON ENERGY LEVELS;

EID: 31744442572     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2202     Document Type: Article

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