Phase transition of copper (II) phthalocyanine thin films characterized by a near-field scanning microwave microscope

Thin Solid Films

Volumn 499, Issue 1-2, 2006, Pages 318-321

  Park, Miehwa ^a   Yoo, Hyunjun ^a   Yoo, Hyungun ^a   Na, Seungwook ^a   Kim, Songhui ^a   Lee, Kiejin ^a   Friedman, Barry ^b   Lim, Eunju ^c   Iwamoto, Mitsumasa ^c  

^a Sogang University   (South Korea)

^b SAM HOUSTON STATE UNIVERSITY   (United States)

^c TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Copper (II) phthalocyanine thin films; Near field scanning microwave microscope (NSMM); Phase transition; Surface resistance

Indexed keywords

CRYSTAL STRUCTURE; MICROWAVES; NEAR FIELD SCANNING OPTICAL MICROSCOPY; PHASE TRANSITIONS; THIN FILMS;

COPPER (II) PHTHALOCYANINE THIN FILMS; NEAR-FIELD SCANNING MICROWAVE MICROSCOPE (NSMM); PHASE TRANSITION; SURFACE RESISTANCE;

COPPER COMPOUNDS;

EID: 31544475927     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.119     Document Type: Conference Paper

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