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Volumn 44, Issue 7 A, 2005, Pages 4848-4854
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Nanolaminated Ta2O5-Al2O3 insulator effect on luminescent and electrical properties of thin-film electroluminescent devices
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Author keywords
Atomic layer deposition; Nanolaminated insulator; Ta2o5 al2o 3; Thin film electroluminescent device; ZnS:Tb TFEL
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Indexed keywords
ALUMINUM COMPOUNDS;
CHARGE TRANSFER;
DEPOSITION;
ELECTRIC PROPERTIES;
ELECTROLUMINESCENCE;
PERMITTIVITY;
THIN FILM DEVICES;
ZINC SULFIDE;
ATOMIC LAYER DEPOSITION;
NANOLAMINATED INSULATOR;
THIN-FILM ELECTROLUMINESCENT DEVICE;
TANTALUM COMPOUNDS;
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EID: 31544472853
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.44.4848 Document Type: Article |
Times cited : (3)
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References (21)
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