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Volumn 44, Issue 7 A, 2005, Pages 4848-4854

Nanolaminated Ta2O5-Al2O3 insulator effect on luminescent and electrical properties of thin-film electroluminescent devices

Author keywords

Atomic layer deposition; Nanolaminated insulator; Ta2o5 al2o 3; Thin film electroluminescent device; ZnS:Tb TFEL

Indexed keywords

ALUMINUM COMPOUNDS; CHARGE TRANSFER; DEPOSITION; ELECTRIC PROPERTIES; ELECTROLUMINESCENCE; PERMITTIVITY; THIN FILM DEVICES; ZINC SULFIDE;

EID: 31544472853     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.4848     Document Type: Article
Times cited : (3)

References (21)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.