Reoxidation after NH3 plasma nitridation for multiple-thickness oxynitrides

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 8, 2005, Pages 5964-5969

  Lai, Chao Sung ^a   Fan, Kung Ming ^a  

^a CHANG GUNG UNIVERSITY   (Taiwan)

Author keywords

NH3 plasma; Nitridation; Oxynitride; RT N2O

Indexed keywords

AMMONIA; DIELECTRIC FILMS; PLASMAS; RELIABILITY;

NH3 PLASMA; NITRIDATION; OXYNITRIDE; RT N2O;

OXIDATION;

EID: 31544469782     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.5964     Document Type: Article

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