Mapping contact potential differences with noncontact atomic force microscope using resonance frequency shift versus sample bias voltage curves

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 11, 2005, Pages 8113-8115

  Kitamura, Shin'ichi ^a,c   Yonei, Kazunori ^a   Iwatsuki, Masashi ^a   Mooney, C B ^b   Fukuda, Yasuo ^c  

^a JEOL LTD   (Japan)

^b NORTH CAROLINA STATE UNIVERSITY   (United States)

^c SHIZUOKA UNIVERSITY   (Japan)

Author keywords

CPD; F v curve; NC AFM; SKPM; SPS mapping; UHV

Indexed keywords

DATA ACQUISITION; ELECTRIC POTENTIAL; NATURAL FREQUENCIES; ULTRAHIGH VACUUM;

CPD; NC-AFM; SKPM; SPS MAPPING; UHV;

ATOMIC FORCE MICROSCOPY;

EID: 31544450518     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.8113     Document Type: Article

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