Effect of He plasma treatment on the rectification properties of Al/CdTe schottky contacts

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 9 A, 2005, Pages 6742-6746

  Toyama, Hiroyuki ^a   Yamazato, Masaaki ^a   Higa, Akira ^a   Maehama, Takehiro ^a   Ohno, Ryoichi ^b   Toguchi, Minoru ^a  

^a UNIVERSITY OF THE RYUKYUS   (Japan)

^b Acrorad Co Ltd   (Japan)

Author keywords

CdTe; He plasma treatment; Schottky barrier; X ray and ray detector

Indexed keywords

ALUMINUM COMPOUNDS; BROMINE; CADMIUM COMPOUNDS; COMPOSITION; ELECTRIC PROPERTIES; ETCHING; GAMMA RAYS; METHANOL; PLASMA THEORY; SCHOTTKY BARRIER DIODES; X RAY PHOTOELECTRON SPECTROSCOPY;

CDTE; HE PLASMA TREATMENT; SCHOTTKY BARRIER;

HELIUM;

EID: 31544443549     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.6742     Document Type: Article

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