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Volumn 27, Issue 2, 2006, Pages 81-83

A normally off GaN n-MOSFET with Schottky-barrier source and drain on a Si-auto-doped p-GaN/Si

Author keywords

GaN; MOSFET; Schottky barrier (SB)

Indexed keywords

DEPOSITION; GATES (TRANSISTOR); SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; SUBSTRATES; TRANSCONDUCTANCE;

EID: 31544442977     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2005.862675     Document Type: Article
Times cited : (56)

References (9)
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  • 4
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    • 3 interfaces: A microscopic mechanism for low defect density interfaces in remote plasma processed MOS devices prepared on polar GaN faces"
    • 3 interfaces: A microscopic mechanism for low defect density interfaces in remote plasma processed MOS devices prepared on polar GaN faces," Microelectron. Eng., vol. 48, pp. 303-306, 1999.
    • (1999) Microelectron. Eng. , vol.48 , pp. 303-306
    • Therrien, R.1    Niimi, H.2    Gehrke, T.3    Lucovsky, G.4    Davis, R.5
  • 7
    • 29244450764 scopus 로고    scopus 로고
    • "High performance 50-nm-gate-length schottky-source/drain MOSFETs with dopant-segregations"
    • A. Kinoshita, C. Tanaka, K. Uchida, and J. Koga, "High performance 50-nm-gate-length schottky-source/drain MOSFETs with dopant-segregations," in Symp. VLSI Tech. Dig., 2005, pp. 158-159.
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  • 8
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    • submitted for publication
    • H.-I. Cho, D.-K. Kim, H.-B. Lee, S.-H. Hahm, Y.-H. Bae, M.-K. Kim, and J.-H. Lee, "The origin of P-type conduction in unintentionally doped GaN film grown on Si-Substrate," Appl. Phys. Lett., submitted for publication.
    • Appl. Phys. Lett.
    • Cho, H.-I.1    Kim, D.-K.2    Lee, H.-B.3    Hahm, S.-H.4    Bae, Y.-H.5    Kim, M.-K.6    Lee, J.-H.7
  • 9
    • 46049100685 scopus 로고    scopus 로고
    • "Normally off operation of nonpolar AlGaN/GaN heterojunction FETs grown on R-plane sapphire"
    • M. Kuroda, H. Ishida, T. Ueda, and T. Tanaka, "Normally off operation of nonpolar AlGaN/GaN heterojunction FETs grown on R-plane sapphire," Proc. Solid State Devices and Materials, pp. 470-471, 2005.
    • (2005) Proc. Solid State Devices and Materials , pp. 470-471
    • Kuroda, M.1    Ishida, H.2    Ueda, T.3    Tanaka, T.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.