-
1
-
-
19044383175
-
"Ion implanted A1GaN-GaN HEMTs with nonalloyed ohmic contacts"
-
May
-
H. Yu, L. McCarthy, S. Rajan, S. Keller, S. Denbaars, J. Speck, and U. Mishra, "Ion implanted A1GaN-GaN HEMTs with nonalloyed ohmic contacts," IEEE Electron Device Lett., vol. 26, no. 5, pp. 283-285, May 2005.
-
(2005)
IEEE Electron Device Lett.
, vol.26
, Issue.5
, pp. 283-285
-
-
Yu, H.1
McCarthy, L.2
Rajan, S.3
Keller, S.4
Denbaars, S.5
Speck, J.6
Mishra, U.7
-
2
-
-
12344314332
-
"High-voltage normally off GaN MOSFETs on sapphire substrates"
-
Jan
-
K. Matocha, T. Paul Chow, and R. J. Gutmann, "High-voltage normally off GaN MOSFETs on sapphire substrates," IEEE Trans. Electron Devices, vol. 52, no. 1, pp. 6-10, Jan. 2005.
-
(2005)
IEEE Trans. Electron Devices
, vol.52
, Issue.1
, pp. 6-10
-
-
Matocha, K.1
Paul Chow, T.2
Gutmann, R.J.3
-
3
-
-
2342590717
-
"MgO/p-GaN enhancement mode metal-oxide semi-conductor field-effect transistors"
-
Y. Irokawa, Y. Nakano, M. Ishiko, T. Kachi, J. Kim, F. Ren, B. P. Gila, A. H. Onstine, C. R. Abernathy, S. J. Pearton, C.-C. Pan, G.-0T. Chen, and J.-I. Chyi, "MgO/p-GaN enhancement mode metal-oxide semi-conductor field-effect transistors," Appl. Phys. Lett., vol. 84, no. 15, pp. 2919-2921, 2004.
-
(2004)
Appl. Phys. Lett.
, vol.84
, Issue.15
, pp. 2919-2921
-
-
Irokawa, Y.1
Nakano, Y.2
Ishiko, M.3
Kachi, T.4
Kim, J.5
Ren, F.6
Gila, B.P.7
Onstine, A.H.8
Abernathy, C.R.9
Pearton, S.J.10
Pan, C.-C.11
Chen, G.-T.12
Chyi, J.-I.13
-
4
-
-
0005787145
-
"GaN FETs for high-temperature and microwave applications"
-
S. C. Binari, "GaN FETs for high-temperature and microwave applications," Proc. Electrochem. Soc., vol. 21, pp. 136-143, 1995.
-
(1995)
Proc. Electrochem. Soc.
, vol.21
, pp. 136-143
-
-
Binari, S.C.1
-
5
-
-
0033184799
-
"GaN metal oxide semiconductor field effect transistors"
-
F. Ren, S. J. Pearton, C. R. Abernathy, A. Baca, P. Cheng, R. J. Shul, S. N. G. Chu, M. Hong, M. J. Schurman, and J. R. Lothian, "GaN metal oxide semiconductor field effect transistors," Solid State Electron., vol. 43, pp. 1817-1820,,1999.
-
(1999)
Solid State Electron.
, vol.43
, pp. 1817-1820
-
-
Ren, F.1
Pearton, S.J.2
Abernathy, C.R.3
Baca, A.4
Cheng, P.5
Shul, R.J.6
Chu, S.N.G.7
Hong, M.8
Schurman, M.J.9
Lothian, J.R.10
-
6
-
-
0033190231
-
3 interfaces: A microscopic mechanism for low defect density interfaces in remote plasma processed MOS devices prepared on polar GaN faces"
-
3 interfaces: A microscopic mechanism for low defect density interfaces in remote plasma processed MOS devices prepared on polar GaN faces," Microelectron. Eng., vol. 48, pp. 303-306, 1999.
-
(1999)
Microelectron. Eng.
, vol.48
, pp. 303-306
-
-
Therrien, R.1
Niimi, H.2
Gehrke, T.3
Lucovsky, G.4
Davis, R.5
-
7
-
-
29244450764
-
"High performance 50-nm-gate-length schottky-source/drain MOSFETs with dopant-segregations"
-
A. Kinoshita, C. Tanaka, K. Uchida, and J. Koga, "High performance 50-nm-gate-length schottky-source/drain MOSFETs with dopant-segregations," in Symp. VLSI Tech. Dig., 2005, pp. 158-159.
-
(2005)
Symp. VLSI Tech. Dig.
, pp. 158-159
-
-
Kinoshita, A.1
Tanaka, C.2
Uchida, K.3
Koga, J.4
-
8
-
-
31544449773
-
"The origin of P-type conduction in unintentionally doped GaN film grown on Si-Substrate"
-
submitted for publication
-
H.-I. Cho, D.-K. Kim, H.-B. Lee, S.-H. Hahm, Y.-H. Bae, M.-K. Kim, and J.-H. Lee, "The origin of P-type conduction in unintentionally doped GaN film grown on Si-Substrate," Appl. Phys. Lett., submitted for publication.
-
Appl. Phys. Lett.
-
-
Cho, H.-I.1
Kim, D.-K.2
Lee, H.-B.3
Hahm, S.-H.4
Bae, Y.-H.5
Kim, M.-K.6
Lee, J.-H.7
-
9
-
-
46049100685
-
"Normally off operation of nonpolar AlGaN/GaN heterojunction FETs grown on R-plane sapphire"
-
M. Kuroda, H. Ishida, T. Ueda, and T. Tanaka, "Normally off operation of nonpolar AlGaN/GaN heterojunction FETs grown on R-plane sapphire," Proc. Solid State Devices and Materials, pp. 470-471, 2005.
-
(2005)
Proc. Solid State Devices and Materials
, pp. 470-471
-
-
Kuroda, M.1
Ishida, H.2
Ueda, T.3
Tanaka, T.4
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