Explanation of the enhancement of NiSi thermal stability according to TFD equations and Miedema's model

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 222, Issue 3-4, 2004, Pages 462-468

  Wang, R N ^a   He, Y ^a   Feng, J Y ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

Heat of formation; Nickel silicide; Thermal stability

Indexed keywords

ANNEALING; CMOS INTEGRATED CIRCUITS; ENTROPY; EVAPORATION; SUBSTRATES; THERMODYNAMIC STABILITY; X RAY DIFFRACTION ANALYSIS;

HEAT OF FORMATION; NICKEL SILICIDES; SHEET RESISTANCE; THOMAS-FERMI-DIRAC (TFD) EQUATIONS;

NICKEL COMPOUNDS;

EID: 3142751208     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2004.02.023     Document Type: Article

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