Preparation and two-photon lithography of a sulfur containing resin with high refractive index

Journal of Photopolymer Science and Technology

Volumn 17, Issue 1, 2004, Pages 115-118

  Murakami, Yasuharu ^a   Coenjarts, Christopher A ^b   Ober, Christopher K ^b  

^a HITACHI LTD   (Japan)

^b Cornell University   (United States)

Author keywords

High refractive index; Micro stereolithography; Photonic crystal; Two photon lithography

Indexed keywords

COUMARIN; EPOXIDE; IODINE DERIVATIVE; IODONIUM SALT; RESIN; SULFUR; THIOCYANATE POTASSIUM; UNCLASSIFIED DRUG;

CONFERENCE PAPER; CRYSTAL STRUCTURE; PHOTON; POLYMERIZATION; REFRACTION INDEX; STRUCTURE ANALYSIS; SYNTHESIS; TWO PHOTON LITHOGRAPHY;

EID: 3142616881     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.17.115     Document Type: Conference Paper

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