Deep dry-etch of silica in a helicon plasma etcher for optical waveguide fabrication

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 1, 2005, Pages 146-150

  Li, W T ^a   Bulla, D A P ^a   Love, J ^a   Luther Davies, B ^a   Charles, C ^a   Boswell, R ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; PHOTORESISTS; SURFACE ROUGHNESS; THIN FILMS; WAVEGUIDES;

CONVENTIONAL MATERIALS; ETCHING SELECTIVITY; WAVEGUIDE FABRICATION;

SILICA;

EID: 31044456005     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1842114     Document Type: Article

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