Comparison of forming gas effects on the ferroelectric properties between more-oriented and less-oriented Pb(Zr0.52Ti0.48)O 3 thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 4, 2005, Pages 773-776

  Lee, Eun Sun ^a   Chung, Hyun Woo ^a   Lim, Sung Hoon ^a   Lee, Sang Yeol ^a  

^a Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEGRADATION; FERROELECTRIC MATERIALS; LEAKAGE CURRENTS; POLARIZATION; PULSED LASER DEPOSITION; REMANENCE; SUBSTRATES;

FORMING GAS EFFECTS; LEAD ZIRCONATE TITANATE (PZT); SUBSTRATE TEMPERATURE;

LEAD COMPOUNDS;

EID: 31044455587     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1913675     Document Type: Conference Paper

References (17)

1. J. F. Scott and C. A. Paz De Araujo, Science 246, 1400 (1989).
2. B. H. Park, B. S. Kang, S. D. Bu, T. W. Noh, J. Lee, and W. Jo, Nature (London) 401, 682 (1999).
3. M. Lim, V. Joshi, S. Narayan, J. Celinska, and J. Karawawa, Appl. Phys. Lett. 81, 1863 (2002).
4. C. A. Paz De Araujo, J. D. Cuchiaro, L. D. McMillan, M. C. Scott, and J. F. Scott, Nature (London) 374, 627 (1995).
5. K. Niwa, Y. Kotaka, M. Tomotani, H. Ashida, Y. Goto, and S. Otani, Acta Mater. 48, 4755 (2000).
6. S. Aggarwal, S. R. Perusse, C. W. Tipton, R. Ramesh, H. D. Drew, T. Venkatesan, D. B. Romero, V. B. Podobedov, and A. Weber, Appl. Phys. Lett. 73, 1973 (1998).
7. C. H. Park and D. J. Chadi, Phys. Rev. Lett. 84, 4717 (2000).
8. T. Tamura, K. Matsuura, H. Ashida, K. Kondo, and S. Otani, Appl. Phys. Lett. 74, 3395 (1999).
9. J. Im, O. Auciello, A. R. Krauss, D. M. Gruen, R. P. H. Chang, S. H. Kim, and A. I. Kingon, Appl. Phys. Lett. 74, 1162 (1999).
10. K. Kushida-Abdelghafar, H. Miki, K. Torii, and Y. Fujisaki, Appl. Phys. Lett. 69, 3188 (1996).
11. J.-P. Han and T. P. Ma, Appl. Phys. Lett. 71, 1267 (1997).
12. J. Lee and S. Joo, Appl. Phys. Lett. 81, 3230 (2002).
13. S. Aggarwal, S. R. Perusse, C. J. Kerr, R. Ramesh, D. B. Romero, J. T. Evans, Jr., L. Boyer, and G. Velasquez, Appl. Phys. Lett. 76, 918 (2000).
14. Y. Shimamoto, K. Kushida-Abdelghafar, H. Miki, and Y. Fujisaki, Appl. Phys. Lett. 70, 3096 (1997).
15. S. J. Lee, K. Y. Kang, S. K. Han, M. S. Jang, B. G. Chae, and S. H. Kim, Appl. Phys. Lett. 72, 299 (1998).
16. K. B. Han, C. H. Jeon, H. S. Jhon, and S. Y. Lee, Thin Solid Films 437, 285 (2003).
17. C. H. Jeon, C. S. Kim, K. B. Han, H. S. Jhon, and S. Y. Lee, Mater. Sci. Eng., B 109, 141 (2004).