Evaluation of halogenated polyimide etching for optical waveguide fabrication by using inductively coupled plasma

Journal of Applied Polymer Science

Volumn 79, Issue 1, 2001, Pages 176-182

  Han, Kwansoo ^a   Kim, Junghee ^a   Jang, Woo Hyuk ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

HALOGENATION; INDUCTIVELY COUPLED PLASMA; ION BOMBARDMENT; OPTICAL WAVEGUIDES; PLASMA ETCHING; SURFACE ROUGHNESS;

CHAMBER PRESSURE; ION ENERGY;

POLYIMIDES;

EID: 0035151770     PISSN: 00218995     EISSN: None     Source Type: Journal    
DOI: 10.1002/1097-4628(20010103)79:1<176::AID-APP200>3.0.CO;2-7     Document Type: Article

References (15)

1. Han, K.; Lee, H.; Rhee, T. J Appl Polym Sci 1999, 74, 107.
2. Matsuura, T.; Kobayashi, J.; Ando, S.; Maruno, T.; Sasaki, S.; Yamamoto, F. Appl Opt 1999, 38, 966.
3. Kobayashi, J.; Matsuura, T.; Hida, Y.; Sasaki, S.; Marunu, T. J Lightwave Technol 1998, 16, 1024.
4. Matsuura, T.; Ishizawa, M.; Hasuda, Y.; Nishi, S. Macromolecules 1992, 25, 3540.
5. Matsuura, T.; Yamada, N.; Nishi, S.; Hasuda, Y. Macromolecules 1993, 26, 419.
6. Lucas, B.; Moussant, C.; Moliton, A.; Zyss, J. Polym Int 1998, 47, 210.
7. Kagami, M.; Ito, H.; Ichikawa, T.; Kato, S.; Matsuda, M.; Takahashi, N. Appl Opt 1995, 34, 1041.
8. Chen, A.; Kaviani, K.; Rempel, A. W.; Kalluri, S.; Steier, W. H.; Shi, Y.; Liang, Z.; Dalton, L. R. J Electrochem Soc 1996, 143, 3648.
9. Matssura, T.; Ando, S.; Sasaki, S.; Yamamoto, F. Electron Lett 1993, 29, 269.
10. Matssura, T.; Ando, S.; Matsui, S.; Sasaki, S.; Yamamoto, F. Electron Lett 1993, 29, 2107.
11. Keller, H.; Forster, J. C.; Barnes, M. S. J Vac Sci Technol A 1993, 11, 2487.
12. Barnes, M. S.; Forster, J. C.; Keller, H. Appl Phys Lett 1993, 62, 2622.
13. Shine, H. J.; Zmuda, H.; Park, K. H.; Kwart, H.; Horgan, A. G.; Collins, C.; Maxwell, B. E. J Am Chem Soc 1981, 103, 955.
14. Lee, S. Ph.D. Dissertation, University of Akron, 1993.
15. Manos, D. M.; Flamm, D. L. Plasma Etching; Academic: San Diego, CA, 1989.