Generation of self-ignition plasma and extracted ion current in a burst RF inductively coupled plasma of carbon-containing gases

Surface and Coatings Technology

Volumn 186, Issue 1-2 SPEC. ISS., 2004, Pages 187-189

  Watanabe, Satoshi ^a   Tanaka, Takeshi ^a   Takagi, Toshinori ^a   Yukimura, Ken ^b  

^a HIROSHIMA INSTITUTE OF TECHNOLOGY   (Japan)

^b DOSHISHA UNIVERSITY   (Japan)

Author keywords

Ion current; Plasma based ion implantation; RF plasma

Indexed keywords

ELECTRIC POTENTIAL; ELECTRIC PROPERTIES; ETHANE; INDUCTIVELY COUPLED PLASMA; METHANE;

ION CURRENTS; RF PLASMAS; SELF-IGNITION PLASMAS (SIP);

PLASMAS;

PLASMA TREATMENT;

EID: 17644400507     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.04.044     Document Type: Article

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